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Tempress LPCVD E2

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Tempress LPCVD E2

Contact details

van den Bogaard, Alex Ing.
Electrical Engineering, Mathematics and Computer Science (EWI), DIMES
Feldmannweg 17, 2628 CT Delft
Tel : +31 (0)15 27 88211
E-mail : a.vandenbogaard@tudelft.nl
Website : Open website

General Information

Instrument:

Tempress LPCVD E2

Description

Low pressure chemical vapor deposition of silicon nitride

Location:

Dimes Class 100

Key words:

low stress, LPCVD, silicon nitride

Main application:

Protective coating, MEMS material on clean substrates

Instrument specification

Stoichiometric Silicon Nitride, low stress silicon nitride
Wafersize: 4inch-6 inch