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Ion implanter Varian 350D

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Ion Implanter.png

Contact details

Schut, Henk Dr.
Applied Sciences (TNW), Section NPM2 (Neutron and Positron Methods in Materials)
Mekelweg 15, 2629 JB Delft
Tel : +31 (0)15 27 81961
E-mail : h.schut@tudelft.nl
Website : Open website

General Information


Ion implanter Varian 350D


Experimental hall, Reactor Institute Delft, Mekelweg 15, Delft (building #50)

Key words:

Ion Implantation

Main application:

Implantation of various ions in metals, insulators and semiconductors. E.g. H, D, He, C, O, Ne, Zn, Se, Kr, Cd, Xe, Pb in Al, Ti, Mg, MgO, Si.

Instrument specification

Maximum energy:
150 keV

Beam current:
60 mA

Maximum sample size:
4 inch

Further contact:
J. de Roode
E-mail: J.deroode@iri.tudelft.nl
Tel: +31 (0)15 27 81344